Design of Diffraction Lithography Masks using Artificial Intelligence for R&D Processes

Description

This project focuses on the design and simulation of supersonic beam sources , with a special emphasis on studying the influence of geometric and physical parameters on their performance and stability. By applying advanced modeling and numerical optimization techniques , the work seeks to improve the control and efficiency of experimental setups. In parallel, the project addresses the development of theoretical and computational models of quantum decoherence for systems that interact with their environment, integrating fundamental research with next-generation lithography technological processes.

Background

Andreu holds a double degree in Mathematics and Physics from the University of Barcelona. His experience includes a stay at the Center for Mathematical Research during the summer of 2024 and a period as a research assistant in the Department of Quantum Physics and Astrophysics of the University of Barcelona between October 2024 and May 2025. He is currently pursuing a Master of Advanced Studies in Mathematics (Theoretical Physics) at the University of Cambridge , consolidating an academic base of excellence for the resolution of complex problems at the frontier of physics.

Motivation

His career is driven by a deep fascination with theoretical frameworks that explain the foundations of reality. Through his collaboration with Lace Lithography , Andreu seeks to connect these theoretical models with real-world applications in the industrial world. His main goal is to apply his knowledge to understand phenomena on a "profoundly small" scale, bringing analytical rigor to innovation in manufacturing processes and technological research.