Design of Diffraction Lithography Masks using Artificial Intelligence for R&D Processes

Design of Diffraction Lithography Masks using Artificial Intelligence for R&D Processes

Research Support Investigator

Victor Rubio Jimenez

Victor Rubio Jimenez

Degree in Mathematics and Physics

Host Organization

Supervisors

Jordi Cortadella

Jordi Cortadella

UPC supervisor

The content of this website reflects only the views of the Catedra Chip Chair UPC project.

Development of an innovative atomic diffraction lithography system

Manu Canals i Codina

Manu Canals i Codina

Research Support Investigator

Design of Diffraction Lithography Masks using Artificial Intelligence for R&D Processes

Andreu Vega Casanovas

Andreu Vega Casanovas

Research Support Investigator

This site is registered on wpml.org as a development site. Switch to a production site key to remove this banner.